Causes of Surface Stripe of Sputtering Coated Niobium Target
Release time:
2024-02-27
Niobium targets are mainly used in optical coating, surface engineering materials coating and heat resistance, corrosion resistance and high conductivity coating industry. In the field of optical coating, it is mainly used in ophthalmic optical products, lenses, precision optics, large area coating, 3D coating and so on.
The niobium target material is usually called a bare target. First, it is welded to a copper back target, and then sputtering is performed, and the niobium atoms are deposited on the substrate material in the form of oxides to achieve sputtering coating. With the continuous deepening and expansion of niobium target technology and application, the requirements for the microstructure uniformity of niobium target are improved, mainly in the three aspects of grain size refinement, no obvious texture orientation and chemical purity improvement.
The distribution of the microstructure and properties of the whole target is uniform, which is very important to ensure the sputtering performance of the niobium target. The surface of the niobium target encountered in industrial production usually has regular lines, which will greatly affect the sputtering performance of the target. How can we improve the utilization rate of the target?
The study found that the impurity content (target purity) is an important factor affecting the purity. The chemical composition of the raw material is uneven, impurity enrichment, after the late rolling processing, the formation of niobium target surface regular lines; eliminate the uneven distribution of raw material composition and impurity enrichment, can avoid the formation of niobium target surface regular lines. The effect of grain size and tissue composition on the target is almost negligible.
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