Preparation Technology and Application of High Purity Tungsten Target
Release time:
2024-02-27
Due to the high temperature stability, high electron migration resistance and high electron emission coefficient, high purity tungsten and tungsten alloy targets are mainly used in the manufacture of gate electrodes, connecting wires, diffusion barriers, etc. of semiconductor integrated circuits, and have extremely high requirements on material purity, impurity element content, density, grain size and grain structure uniformity.
Effect of 1. sintering temperature
The forming process of the tungsten target embryo body is generally made by cold isostatic pressing, and the tungsten grains will grow up during the sintering process, and the growth of the tungsten grains will fill the gaps between the grain boundaries, thereby increasing the density of the tungsten target. With the increase of sintering times, the density of tungsten target gradually slows down. The main reason is that after multiple sintering, the quality of the tungsten target material has not changed much. Since most of the voids in the grain boundaries are filled with tungsten crystals, after each sintering, the overall dimensional change rate of the tungsten target material is already very small, resulting in limited space for increasing the density of the tungsten target material. As the sintering proceeds, the grown tungsten grains are filled into the voids, resulting in a higher density of the target with a small particle size.
Effect of 2. holding time
Under the same sintering temperature, with the extension of the sintering holding time, the compactness of the tungsten target is correspondingly improved, with the extension of the holding time, the tungsten grain size is increased, and with the extension of the holding time, the grain size growth multiple gradually slows down, which shows that improving the holding time can also improve the performance of the tungsten target.
Effect of 3. Rolling on the Properties of Target
In order to improve the density of the tungsten target material and obtain the processing structure of the tungsten target material, the medium temperature rolling of the tungsten target material must be carried out below the recrystallization temperature. When the rolling temperature of the target blank is high, the fibrous tissue of the target blank is coarser, whereas the fibrous tissue of the target material is finer. When the warm rolling rate is above 95%. Although the original grain of sintering is different or the fiber tissue difference caused by different rolling temperature will be eliminated, the internal tissue of the target material will form a more uniform fiber tissue, so the higher the processing rate of warm rolling, the better the performance of the target material.
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